| 第 33 卷第 1 期 |  | Vol. 33 No. 1 | | 2003 年 2 月 | Feb 2003 |
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所属栏目：专论与综述
紫外光固化光敏齐聚物体系的研究进展 |
| 周钢; 陈建山; 奚海; 吴宇雄(中南林学院高分子材料与工程教研室; 湖南株洲; 412006) |
| 摘 要：介绍了近年来国内外紫外光固化体系的研究进展。重点对第二代光敏齐聚物 -丙烯酸酯体系的制备过程、组分及对性能影响进行介绍 ,探讨了光固化体系氧干扰、星形超分枝聚合物等问题。 |
| 关键词：紫外光固化; 光敏齐聚物; 光敏树脂; 光固化涂料; 研究进展 |
| 中图分类号：TQ630.4 文献标识码：A 文章编号：1009-9212(2003)01-0005-03 |
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| Progress on UV-Curing Photosensitive Oligomer |
| ZHOU Gang; et al.（Polymer Material and Engineering Group; Central-South Forestry University; Zhuzhou; Hunan; 412006; China） |
| Abstract：Recent progress on UV-curing photosensitive oligomer was reviewed. The emphasis was put on the components and preparation of second phase photosensitive oligomer-acrylic resin and their effect on the resin. The oxidization, high-grafting star polymerization of photocuring resin were also discussed. |
| Key words：UV-curing; photosensitive oligomer; photosensitive resin; photocuring paint |
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收稿日期：2002-11-15
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